Innovative dry etching process of exotic materials


The advantageous properties (electro-optical, - acoustic, -mechanical) of new materials such as Sc-doped ALN, LNO, LTO or KNN make them essential to meet the development needs of integrated optics, RF telecommunication and microsystems. The production of patterns with submicron dimensions with a significant etch rate (gt;100nm/min), a vertical profile and a reduced roughness of the patternapos;s sidewalls are the main goals of the thesis work so as to satisfy the performance criteria of the devices targeted at the application level.

Master 2 science des matériaux

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