In situ study of the impact of the electric field on the properties of chalcogenide materials

Chalcogenide materials (PCM, OTS, NL, TE, FESO, etc.) are the basis of the most innovative concepts in microelectronics, from PCM memories to the new neuromorphic and spinorbitronic devices (FESO, SOT-RAM, etc.). Part of their operation relies on out-of-equilibrium physics induced by the electronic excitation resulting from the application of an intense electric field. The aim of this thesis is to measure experimentally on chalcogenide thin films the effects induced by the intense electric field on the atomic structure and electronic properties of the material with femtosecond (fs) time resolution. The 'in-operando' conditions of the devices will be reproduced using a THz fs pulse to generate electric fields of the order of a few MV/cm. The induced changes will then be probed using various in situ diagnostic methods (optical spectroscopy or x-ray diffraction and/or ARPES). The results will be compared with ab initio simulations using a state-of-the-art method developed with the University of Liège. Ultimately, the ability to predict the response of different chalcogenide alloys on time scales fs under extreme field conditions will make it possible to optimise the composition and performance of the materials (e- switch effect, electromigration of species under field conditions, etc.), while providing an understanding of the underlying fundamental mechanisms linking electronic excitation, evolution and the properties of the chalcogenide alloys.