Next-Gen Surface Analysis for Ultrathin Functional Materials

Job description: Advanced nanoelectronics and quantum devices rely on ultrathin oxides and engineered interfaces whose chemical composition, stoichiometry and thickness must be controlled with sub-nanometer precision. LETI is installing the first 300-mm multi-energy XPS–HAXPES tool with angle-resolved capability, enabling quasi in situ chemical metrology from deposition to characterization. This PhD will develop quantitative, multi-energy and angle-resolved XPS/HAXPES methodologies for ultrathin oxides and oxynitrides, validate measurement accuracy, and establish robust protocols for quasi in situ transfer of sensitive layers. Applications include advanced CMOS stacks and quantum Josephson junctions, where sub-2 nm AlOx barriers critically determine device performance. The project directly supports the development of next-generation quantum technologies, advanced photonics and energy-efficient microelectronics by improving the reliability and stability of nanoscale materials. The work will be carried out within a strong multi-partner framework.

Your profile: Ecole dapos;ingénieur, Master Physique ou Chimie-Physique